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Applications and Fundamentals, Part 2, Inductively Coupled Plasma Emission SpectroscopyFrom Wiley-Interscience
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In the 1960s, the development of inductively coupled plasmas (ICP) as excitation sources for atomic emission spectroscopy (AES) permitted, for the first time, the convenient, simultaneous determination of a number of chemical elements in solutions. In two self-contained volumes, this is the first definitive text/reference on ICP-AES since the introduction of this important analytical technique.
Part 1 of Inductively Coupled Plasma Emission Spectroscopy covers the basis of ICP-AES as an analytical method and discusses fundamental analytical concepts, performance, and figures of merit; principles of the instrumentation; the relation between ICP and other modern "plasma sources;" and the connection between ICP-AES, on one hand, and ICP atomic fluorescence spectroscopy and ICP mass spectroscopy, on the other.
Part 2 examines applications and fundamentals of the technique. The overall treatment of the subject is tutorial, systematic, and consistent. The approach is scientific and rigorous, but mathematical formulae are used only when they promote clarity. Aside from filling a void in the AES literature, Inductively Coupled Plasma Emission Spectroscopy provides a critical survey of more than 20 years of research, development, and application in the field of ICP and related plasma sources. It is an excellent handbook for both novices and experts, and it serves as an aidememoire and major source of reference for analytical spectroscopists, analytical chemists, physical chemists and physicists, including those who are researchers, technicians, and applied analysts.
- Sales Rank: #4295743 in Books
- Published on: 1987-06-09
- Original language: English
- Number of items: 1
- Dimensions: 9.19" h x 1.09" w x 6.26" l, 1.83 pounds
- Binding: Hardcover
- 504 pages
From the Publisher
This two-part work covers the state of the art in inductively coupled plasma emission spectroscopy. A comprehensive work, it serves as a text for the novice and a handbook for the expert--providing a new standard in the field of ICP-AES. Filling as essential gap in the AES literature, these two volumes provide a critical and tutorial survey of more than 20 years of research, development, and application in the field of ICPs and related plasma sources. Chapters are essentially self-contained and may be consulted independently.
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